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Thin films of rare earth metal silicides

Author
KOLESHKO, V. M1 ; BELITSKY, V. F; KHODIN, A. A
[1] Byelorussian acad. sci., inst. electronics, Minsk 220841, Byelorussia
Source

Thin solid films. 1986, Vol 141, Num 2, pp 277-285 ; ref : 8 ref

CODEN
THSFAP
ISSN
0040-6090
Scientific domain
Crystallography; Electronics; Metallurgy, welding; Condensed state physics
Publisher
Elsevier Science, Lausanne
Publication country
Switzerland
Document type
Article
Language
English
Keyword (fr)
Accommodation réseau Composition chimique Composé minéral Conductivité électrique Couche mince Croissance cristalline Diffraction RX Etude expérimentale Interface solide solide Lanthanide Siliciure Morphologie Méthode état solide Recuit thermique Surface
Keyword (en)
Mismatch lattice Chemical composition Inorganic compound Electrical conductivity Thin film Crystal growth X ray diffraction Experimental study Solid solid interface Lanthanide Silicides Morphology Growth from solid state Thermal annealing Surface
Keyword (es)
Acomodación red Composicion quimica Compuesto mineral Conductividad electrica Capa delgada Crecimiento cristalino Difraccion RX Estudio experimental Interfase sólido sólido Lantánido Morfologia Método estado sólido Recocido térmico Superficie
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H55 Thin film structure and morphology

Discipline
Physics of condensed state : structure, mechanical and thermal properties
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
8259597

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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