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Investigation of the thermal stability of nitrogen-rich amorphous carbon nitride films

Author
KULISCH, W1 ; POPOV, C1 ; ZAMBOV, L1 ; BULIR, J2 3 ; DELPLANCKE-OGLETREE, M. P2 ; LANCOK, J3 ; JELINEK, M3
[1] Institute of Technical Physics, University of Kassel, Heinrich-Plett-Strasse 40, 34109 Kassel, Germany
[2] Department of Industrial Chemistry, Université Libre de Bruxelles, 50 av. F.D. Roosevelt, 1050 Brussels, Belgium
[3] Institute of Physics, Academy of Science of the Czech Republic, Na Slovance 2, 18221 Prague, Czech Republic
Conference title
Proceedings of the 27th International Conference on Metallurgic Coatings and Thin Films, San Diego, California, April 10-14, 2000
Conference name
International Conference on Metallurgical Coatings and Thin Films (27 ; San Diego, California 2000-04-10)
Author (monograph)
SARTWELL, Bruce D (Editor)1 ; MITTERER, Christian (Editor)2 ; WAHL, Kathryn J (Editor)3 ; PIQUE, Alberto (Editor)4
American Vacuum Society ; Advanced Surface Engineering Division, United States (Funder/Sponsor)
[1] US Naval Research Laboratory, Code 6170, 4555 Overlook Avenue, SW, Washington, DC 20375, United States
[2] The University of Leoben, Department of Physical Metallurgy and Materials Testing, Franz Josef Strasse 18, 8700 Leoben, Austria
[3] US Naval Research Laboratory, Code 6176, 4555 Overlook Avenue, SW, Washington, DC 203785, United States
[4] US Naval Research Laboratory, Code 6372, 4555 Overlook Avenue, SW, Washington, DC 20375, United States
Source

Thin solid films. 2000, Vol 377-78, pp 148-155 ; ref : 38 ref

CODEN
THSFAP
ISSN
0040-6090
Scientific domain
Crystallography; Electronics; Metallurgy, welding; Condensed state physics
Publisher
Elsevier Science, Lausanne
Publication country
Switzerland
Document type
Conference Paper
Language
English
Keyword (fr)
Carbone nitrure Composition chimique Couplage inductif Croissance cristalline en phase vapeur Diffraction RX Dépôt laser Epaisseur Etude expérimentale Haute température Laser pulsé Méthode PECVD Rayon X Recuit thermique Spectre IR Spectre Raman Spectrométrie Auger Spectrométrie photoélectron Stabilité thermique Température ambiante Transformation Fourier C N CNx Composé minéral Nitrure
Keyword (en)
Carbon nitrides Chemical composition Inductive coupling Crystal growth from vapors XRD Laser deposition Thickness Experimental study High temperature Pulsed lasers PECVD X radiation Thermal annealing Infrared spectra Raman spectra AES Photoelectron spectroscopy Thermal stability Ambient temperature Fourier transformation Inorganic compounds Nitrides
Keyword (es)
Acoplamiento inductivo Alta temperatura Recocido térmico
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H60 Physical properties of thin films, nonelectronic / 001B60H60D Thermal stability; thermal effects

Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15F Laser deposition

Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15G Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)

Pacs
6860D Thermal stability; thermal effects

Pacs
8115F Laser deposition

Pacs
8115G Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, etc.)

Discipline
Physics and materials science Physics of condensed state : structure, mechanical and thermal properties
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
841171

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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