Oxidation mechanisms in high pressure DC-sputtered a -Si films
- Autor
- KOROPECKI, R. R; ARLE, R; DE BERNARDEZ, L. S; BUITRAGO, R
INTEC-UNL-CONICET - Fuente
Journal of non-crystalline solids. 1985, Vol 74, Num 1, pp 11-17 ; ref : 12 ref
- CODEN
- JNCSBJ
- ISSN
- 0022-3093
- Campo Científico
- Crystallography; Chemical industry parachemical industry; Metallurgy, welding; Condensed state physics
- Editor
- Elsevier, Amsterdam
- País de la publicación
- Netherlands
- Tipo de documento
- Article
- Idioma
- English
- Palabra clave (fr)
- Couche mince Etat amorphe Etude expérimentale Haute pression Non métal Oxydation Pulvérisation cathodique Silicium Spectre IR
- Palabra clave (in)
- Thin film Amorphous state Experimental study High pressure Non metal Oxidation Cathodic sputtering Silicon Infrared spectrum
- Palabra clave (es)
- Capa delgada Estado amorfo Estudio experimental Alta presion Oxidacion
- Clasificación
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H60 Physical properties of thin films, nonelectronic
- Disciplina
- Physics of condensed state : structure, mechanical and thermal properties
- Procedencia
- Inist-CNRS
- Base de datos
- PASCAL
- Identificador INIST
- 8615061
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/0022-3093(85)90395-3 
https://dx.doi.org/10.1016/0022-3093(85)90395-3
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