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Use of Raman scattering to investigate disorder and crystallite formation in as-deposited and annealed carbon films

Author
DILLON, R. O1 ; WOOLLAM, J. A; KATKANANT, V
[1] Univ. Nebraska, dep. electrical eng., Lincoln NE 68588, United States
Source

Physical review. B, Condensed matter. 1984, Vol 29, Num 6, pp 3482-3489 ; ref : 13 ref

CODEN
PRBMDO
ISSN
0163-1829
Scientific domain
Crystallography; Metallurgy, welding; Condensed state physics
Publisher
American Institute of Physics, Woodbury, NY / American Physical Society, Woodbury, NY
Publication country
United States
Document type
Article
Language
English
Keyword (fr)
Carbone Condensation plasma Couche mince Cristallisation Cristallite Décharge haute fréquence Etat amorphe Etude expérimentale Non métal Pulvérisation faisceau ionique Recuit Spectre Raman Traitement thermique
Keyword (en)
Carbon Plasma condensation Thin film Crystallization Crystallites High frequency discharge Amorphous state Experimental study Non metal Ion beam sputtering Annealing Raman spectrum Heat treatment
Keyword (es)
Estudio experimental
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H55 Thin film structure and morphology

Discipline
Physics of condensed state : structure, mechanical and thermal properties
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
8888848

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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