Studies of the earliest stages of plasma-enhanced chemical vapor deposition of SiO2 on polymeric substrates
- Author
- DENNLER, G1 ; HOUDAYER, A2 ; LATRECHE, M3 ; SEGUI, Y4 ; WERTHEIMER, M. R1
[1] Groupe des Couches Minces (GCM) and Department of Engineering Physics and Materials Engineering, Ecole Polytechnique, C.P. 6079, Station Centre-Ville, Montreal, QC H3C 3A7, Canada
[2] Groupe des Couches Minces (GCM) and Department of Physics, Université de Montréal, Montreal, QC H3C 3J7, Canada
[3] Polyplasma Inc., 3740 Jean Brillant, Montreal, QC H3T 1P1, Canada
[4] Laboratoire de Génie Electrique de Toulouse (LGET), Université Paul Sabatier, 118 route de Narbonne, 31062 Toulouse, France - Source
Thin solid films. 2001, Vol 382, Num 1-2, pp 1-3 ; ref : 11 ref
- CODEN
- THSFAP
- ISSN
- 0040-6090
- Scientific domain
- Crystallography; Electronics; Metallurgy, welding; Condensed state physics
- Publisher
- Elsevier Science, Lausanne
- Publication country
- Switzerland
- Document type
- Article
- Language
- English
- Keyword (fr)
- Couche ultramince Croissance cristalline en phase vapeur Ethylène téréphtalate polymère Etude expérimentale Gravure ionique réactive Imide polymère Matériau semiconducteur Mécanisme croissance Méthode PECVD Polymère Propène polymère RBS Rayon X Revêtement Silicium oxyde Spectrométrie photoélectron Structure Substrat O Si SiO2 Substrat imide polymère Substrat propène polymère Substrat éthylène téréphtalate polymère Composé minéral Oxyde
- Keyword (en)
- Ultrathin films Crystal growth from vapors Ethylene terephthalate polymer Experimental study Reactive ion etching Polyimides Semiconductor materials Growth mechanism PECVD Polymers Polypropylene RBS X radiation Coatings Silicon oxides Photoelectron spectroscopy Structure Substrates Inorganic compounds Oxides
- Keyword (es)
- Etileno tereftalato polímero Grabado iónico reactivo Mecanismo crecimiento Estructura
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15G Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)
- Discipline
- Physics and materials science
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 892757
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/S0040-6090(00)01781-8 
https://dx.doi.org/10.1016/S0040-6090(00)01781-8
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