The range of light ions in polymeric resists
- Author
- ADESIDA, I1 ; KARAPIPERIS, L
[1] Cornell univ., national res. resource facility submicron structures, Ithaca NY 14853, United States - Source
Journal of applied physics. 1984, Vol 56, Num 6, pp 1801-1807 ; ref : 26 ref
- CODEN
- JAPIAU
- ISSN
- 0021-8979
- Scientific domain
- Crystallography; Electronics; Optics; Condensed state physics; Physics
- Publisher
- American Institute of Physics, Woodbury, NY
- Publication country
- United States
- Document type
- Article
- Language
- English
- Keyword (fr)
- Bore Béryllium Carbone Fabrication microélectronique Hydrogène Hélium Lithium Lithographie faisceau ionique Méthacrylate de méthyle polymère Méthode Monte Carlo Pénétration Resist Simulation numérique
- Keyword (en)
- Boron Beryllium Carbon Microelectronic fabrication Hydrogen Helium Lithium Ion beam lithography Methyl methacrylate polymer Monte Carlo method Penetration Resist Digital simulation
- Keyword (es)
- Penetracion
- Classification
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)
- Discipline
- Electronics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 9107559
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1063/1.334189 
https://dx.doi.org/10.1063/1.334189
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