The effects of wafer to wafer defect density variations on integrated circuit defect and fault distributions
- Author
- STAPPER, C. H1
[1] IBM gen. technology div., Essex Junction VT 05452, United States - Source
IBM journal of research and development. 1985, Vol 29, Num 1, pp 87-97 ; ref : 19 ref
- CODEN
- IBMJAE
- ISSN
- 0018-8646
- Scientific domain
- Electronics; Computer science
- Publisher
- International Business Machines, Armonk, NY
- Publication country
- United States
- Document type
- Article
- Language
- English
- Keyword (fr)
- Circuit intégré Densité défaut cristallin Distribution densité Défaillance Modèle
- Keyword (en)
- Integrated circuit Crystal defect density Density distribution Failures Models
- Keyword (es)
- Modelo
- Classification
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F06 Integrated circuits
- Discipline
- Electronics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 9118218
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1147/rd.291.0087 
https://dx.doi.org/10.1147/rd.291.0087
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