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CIRCULAR ETCH PITS IN ION-IMPLANTED AMORPHOUS SILICON FILMS

Author
TU KN; TAN SI; CROWDER BL
IBM THOMAS J. WATSON RES. CENT., YORKTOWN HEIGHTS, N.Y.
Source
APPL. PHYS. LETTERS; U.S.A.; DA. 1973; VOL. 22; NO 6; PP. 274-275; BIBL. 4 REF.
Document type
Serial Issue
Language
English
Keyword (fr)
ATTAQUE CHIMIQUE FIGURE ATTAQUE MATERIAU SEMICONDUCTEUR MATERIAU AMORPHE SILICIUM CONFIGURATION CIRCULAIRE IMPLANTATION IONIQUE EVAPORATION SOUS VIDE COUCHE MINCE TECHNOLOGIE ETAT AMORPHE PIQURE ATTAQUE METHODE PHASE VAPEUR MICROSCOPIE ELECTRONIQUE ELECTROMAGNETISME ELECTRONIQUE CRISTALLOGRAPHIE
Keyword (en)
ELECTROMAGNETISM ELECTRONICS CRISTALLOGRAPHY
Keyword (es)
ELECTROMAGNETISMO ELECTRONICA CRISTALOGRAFIA
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60A Structure of solids and liquids; crystallography

Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics

Discipline
Electronics Physics of condensed state : structure, mechanical and thermal properties
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
PASCAL7314512537

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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