CONDITIONS LEADING TO THE APPEARANCE OF THE NEW MODIFICATION (DELTA -CR) IN THIN VACUUM EVAPORATED CHROMIUM FILMS. II. EFFECT OF SUBSTRATE AND DEPOSITION RATE
- Author
- TOPA V; BIRJEGA MI; SARBU C; POPESCU POGRION N
INST. PHYS., BUCHAREST - Source
- REV. ROUMAINE PHYS.; ROUMAN.; DA. 1973; VOL. 18; NO 2; PP. 219-223; H.T. 8; ABS. FR.; BIBL. 5 REF.
- Document type
- Miscellaneous
- Language
- English
- Keyword (fr)
- CHROME COUCHE MINCE MICROSTRUCTURE EVAPORATION METHODE PHASE VAPEUR TRANSFORMATION PHASE PHASE DELTA EFFET SUPPORT TEMPERATURE SUPPORT VITESSE DEPOT MICROSCOPIE ELECTRONIQUE DIFFRACTION ELECTRON CRISTALLOGRAPHIE
- Keyword (en)
- CRISTALLOGRAPHY
- Keyword (es)
- CRISTALOGRAFIA
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60A Structure of solids and liquids; crystallography
- Discipline
- Physics of condensed state : structure, mechanical and thermal properties
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- PASCAL7316107535
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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