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A TECHNIQUE FOR DIRECTLY PLOTTING THE DOPING PROFILE OF SEMICONDUCTOR WAFERS ("8-SHAPED WAY").

Author
NAKHMANSON RS
INST. SEMICONDUCT. PHYS., NOVOSIBIRSK 630090, USSR
Source
SOLID-STATE ELECTRON.; G.B.; DA. 1976; VOL. 19; NO 1; PP. 87-91; BIBL. 14 REF.
Document type
Article
Language
English
Keyword (fr)
SEMICONDUCTEUR DOPAGE DISTRIBUTION IMPURETE METHODE ETUDE MATERIAU SEMICONDUCTEUR PREPARATION PROFIL DOPAGE TRACE FABRICATION CRISTALLOGRAPHIE ELECTROMAGNETISME ELECTRONIQUE
Keyword (en)
CRISTALLOGRAPHY ELECTROMAGNETISM ELECTRONICS
Keyword (es)
CRISTALOGRAFIA ELECTROMAGNETISMO ELECTRONICA
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60A Structure of solids and liquids; crystallography

Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics

Discipline
Electronics Physics of condensed state : structure, mechanical and thermal properties
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
PASCAL7640105787

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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