A MODIFIED RELIABILITY EXPRESSION FOR THE ELECTROMIGRATION TIME-TO-FAILURE.
- Author
- BOBBIO A; SARACCO O
IST. ELETTROTEC. NAZ. GALILEO FERRARIS, TORINO, ITALY - Source
- MICROELECTRON. AND RELIABIL.; G.B.; DA. 1975; VOL. 14; NO 5-6; PP. 431-433; BIBL. 7 REF.
- Document type
- Article
- Language
- English
- Keyword (fr)
- CIRCUIT INTEGRE COUCHE MINCE ELECTRODIFFUSION FIABILITE DUREE VIE THEORIE TEMPERATURE ELECTROMAGNETISME ELECTRONIQUE
- Keyword (en)
- THIN FILM CIRCUIT ELECTRODIFFUSION RELIABILITY LIFETIME THEORY THEORETICAL STUDIES TEMPERATURE ELECTROMAGNETISM ELECTRONICS
- Keyword (es)
- ELECTROMAGNETISMO ELECTRONICA
- Classification
- Discipline
- Electronics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- PASCAL7730052514
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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