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AN ANALYTICAL TREATMENT ON THE PATTERN FORMATION PROCESS BY SPUTTER ETCHING WITH A MASK.

Author
MATSUO S
NIPPON TELEGRAPH AND TELEPHONE PUBLIC CORP., MUSASHINO-SHI, TOKYO
Source
JAP. J. APPL. PHYS.; JAP.; DA. 1976; VOL. 15; NO 7; PP. 1253-1262; BIBL. 14 REF.
Document type
Article
Language
English
Keyword (fr)
OPTIQUE INTEGREE CIRCUIT OPTIQUE CIRCUIT INTEGRE FABRICATION MICROELECTRONIQUE PULVERISATION FAISCEAU ION GRAVURE FAISCEAU IONIQUE MASQUE COMPOSANT OPTIQUE GRAVURE PULVERISATION METHODE ANALYTIQUE OPTIQUE
Keyword (en)
INTEGRATED OPTICS OPTICAL CIRCUIT INTEGRATED CIRCUIT MICROELECTRONIC FABRICATION ION BEAM ETCHING OPTICAL COMPONENT SPUTTERING ETCHING ANALYTICAL METHOD OPTICS
Keyword (es)
OPTICA
Classification
Pascal
001 Exact sciences and technology / 001B Physics

Discipline
Theoretical physics
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
PASCAL7730089682

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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