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A NOVEL INORGANIC PHOTORESIST UTILIZING AG PHOTODOPING IN SE-GE GLASS FILMS.

Author
YOSHIKAWA A; OCHI O; NAGAI H; MIZUSHIMA Y
NIPPON TELEGRAPH AND TELEPHONE PUBLIC CORP., MUSASHINO-SHI, TOKYO, JAP.
Source
APPL. PHYS. LETTERS; U.S.A.; DA. 1976; VOL. 29; NO 10; PP. 677-679; BIBL. 4 REF.
Document type
Article
Language
English
Keyword (fr)
RESINE PHOTOSENSIBLE VERRE PHOTODOPAGE FABRICATION MICROELECTRONIQUE CHALCOGENURE RESINE MATERIAU AMORPHE RESINE NEGATIVE DOPAGE ARGENT ELECTROMAGNETISME ELECTRONIQUE
Keyword (en)
GLASS PHOTODOPING MICROELECTRONIC FABRICATION CHALCOGENIDES RESINS AMORPHOUS MATERIAL ELECTROMAGNETISM ELECTRONICS
Keyword (es)
ELECTROMAGNETISMO ELECTRONICA
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics

Discipline
Electronics
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
PASCAL7730152161

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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