A MODIFIED METHOD OF ETCHING SEMICONDUCTORS AND MANUFACTURING THIN SILICON SOLID-STATE DETECTORS.
- Author
- SANADA J; FURUNO K; SHIMA K; MOMOI T
TANDEM ACCEL. CENT., UNIV. TSUKUBA, IBARAKI 300-31 - Source
- JAP. J. APPL. PHYS.; JAP.; DA. 1977; VOL. 16; NO 2; PP. 299-301; BIBL. 3 REF.
- Document type
- Article
- Language
- English
- Keyword (fr)
- DETECTEUR RAYONNEMENT SILICIUM COUCHE MINCE GRAVURE MATERIAU SEMICONDUCTEUR OR FABRICATION DETECTEUR PARTICULE DETECTEUR SEMICONDUCTEUR BARRIERE SURFACE BOULE ELECTROMAGNETISME ELECTRONIQUE
- Keyword (en)
- RADIATION DETECTOR SILICON THIN FILM GOLD PARTICLE DETECTOR SEMICONDUCTOR DETECTOR SURFACE BARRIER ELECTROMAGNETISM ELECTRONICS
- Keyword (es)
- ELECTROMAGNETISMO ELECTRONICA
- Classification
- Discipline
- Electronics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- PASCAL7730365204
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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