THERMAL EFFECTS ON THE PHOTORESIST AZ 1350J.
- Author
- DILL FH; SHAW JM
IBM THOMAS I. WATSON RES. CENT., YORKTOWN HEIGHTS, N.Y. 10598 - Source
- I.B.M. J. RES. DEVELOP.; U.S.A.; DA. 1977; VOL. 21; NO 3; PP. 210-218; BIBL. 10 REF.
- Document type
- Article
- Language
- English
- Keyword (fr)
- RESINE RESINE PHOTOSENSIBLE EXPOSITION TEMPERATURE MATERIAU PHOTOSENSIBLE TRAITEMENT PHOTOGRAPHIQUE PHOTOLITHOGRAPHIE REPROGRAPHIE DEVELOPPEMENT ELECTROMAGNETISME ELECTRONIQUE
- Keyword (en)
- RESINS EXPOSURE TEMPERATURE PHOTOSENSITIVE MATERIAL PHOTOGRAPHIC PROCESSING PHOTOLITHOGRAPHY REPROGRAPHY DEVELOPMENT ELECTROMAGNETISM ELECTRONICS
- Keyword (es)
- ELECTROMAGNETISMO ELECTRONICA
- Classification
- Discipline
- Electronics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- PASCAL7730419428
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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