CARACTERISATION DE FILMS ULTRA-MINCES D'OXYDE DE SILICIUM PAR SPECTROSCOPIE DE PHOTOELECTRONS ESCA.
- Author
- HOLLINGER G; JUGNET Y; PERTOSH P; PORTE L; TRAN MINH DUC
INST. PHYS. NUCL., UNIV. CLAUDE-BERNARD, LYON 1, F69621 VILLEURBANNE, FR. - Source
- ANALUSIS; FR.; DA. 1977; VOL. 5; NO 1; PP. 2-10; ABS. ANGL.; BIBL. 35 REF.
- Document type
- Article
- Language
- French
- Keyword (fr)
- SILICIUM OXYDE COUCHE MINCE ANALYSE QUANTITATIVE SPECTROMETRIE PHOTOELECTRONIQUE DEPLACEMENT CHIMIQUE ANALYSE CHIMIQUE SILICIUM MONOCRISTAL INTERFACE SOLIDE SOLIDE REACTION SURFACE ANALYSE SURFACE CONTROLE PROCESSUS OXYDATION REACTION THERMIQUE CHIMIE ANALYTIQUE
- Keyword (en)
- SILICA THIN FILM QUANTITATIVE ANALYSIS CHEMICAL SHIFT CHEMICAL ANALYSIS CHEMICAL COMPOSITION SILICON SINGLE CRYSTAL SOLID SOLID INTERFACE SURFACE REACTION SURFACE ANALYSIS OXIDATION THERMAL REACTION ANALYTICAL CHEMISTRY
- Keyword (es)
- QUIMICA ANALYTICA
- Classification
- Discipline
- General chemistry and physical chemistry
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- PASCAL7760228560
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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