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THE RADIATION HARDNESS OF THE SI-SIO2 INTERFACE AND CARRIER LOCALISATION IN THE INVERSION LAYER.

Author
PEPPER M
CAVENDISH LAB., UNIV. CAMBRIDGE, CAMBRIDGE CB3 0HE
Source
J. PHYS. C; G.B.; DA. 1977; VOL. 10; NO 16; PP. L445-L450; BIBL. 12 REF.
Document type
Article
Language
English
Keyword (fr)
CONTACT ELECTRIQUE CONTACT OXYDE SEMICONDUCTEUR IRRADIATION DURCISSEMENT COUCHE INVERSION PORTEUR CHARGE ELECTRONIQUE
Keyword (en)
ELECTRIC CONTACT SEMICONDUCTOR OXIDE CONTACT IRRADIATION HARDENING INVERSION LAYER CHARGE CARRIER ELECTRONICS
Keyword (es)
ELECTRONICA
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics

Discipline
Electronics
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
PASCAL7830122239

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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