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http://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=PASCAL7830241870

A NEW INTERFEROMETRIC ALIGNMENT TECHNIQUE.

Author
FLANDERS DC; SMITH HI; AUSTIN S
LINCOLN LAB., M.I.T., LEXINGTON, MASS. 02173
Source
APPL. PHYS. LETTERS; U.S.A.; DA. 1977; VOL. 31; NO 7; PP. 426-428; BIBL. 2 REF.
Document type
Article
Language
English
Keyword (fr)
FABRICATION MICROELECTRONIQUE MASQUE ALIGNEMENT INTERFEROMETRIE ELECTRONIQUE
Keyword (en)
MICROELECTRONIC FABRICATION ALIGNMENT INTERFEROMETRY ELECTRONICS
Keyword (es)
ELECTRONICA
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics

Discipline
Electronics
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
PASCAL7830241870

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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