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COMPLEXOMETRIC DETERMINATION OF COPPER AND IRON IN SILICON WITH A CUPRIC ION-SELECTIVE ELECTRODE.

Author
TADDIA M
G. CIAMICIAN CHEM. INST., UNIV., 40126 BOLOGNA, ITALY
Source
MICROCHEM. J.; U.S.A.; DA. 1977; VOL. 22; NO 3; PP. 369-375; BIBL. 8 REF.
Document type
Article
Language
English
Keyword (fr)
COMPLEXOMETRIE DOSAGE CUIVRE II COMPLEXE FER III COMPLEXE ANALYSE QUANTITATIVE ELECTRODE SPECIFIQUE POINT EQUIVALENT ELEMENT TRACE CUIVRE II ION POTENTIOMETRIE CUIVRE FER SILICIUM CHIMIE ANALYTIQUE
Keyword (en)
COMPLEXOMETRY ANALYTICAL DETERMINATION QUANTITATIVE ANALYSIS ION SELECTIVE ELECTRODE EQUIVALENT POINT TRACE ELEMENT POTENTIOMETRY COPPER IRON SILICON ANALYTICAL CHEMISTRY
Keyword (es)
QUIMICA ANALYTICA
Classification
Pascal
001 Exact sciences and technology / 001C Chemistry / 001C01 General and physical chemistry

Discipline
General chemistry and physical chemistry
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
PASCAL7860046265

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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