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A DOUBLE-EXPOSURE TECHNIQUE TO MACROSCOPICALLY CONTROL SUB MICROMETER LINEWIDTHS IN POSITIVE RESIST IMAGES

Author
LIN BJ
I.B.M. THOMAS J. WATSON RES. CENT., YORKTOWN HEIGHTS NY, USA
Source
I.E.E.E. TRANS. ELECTRON DEVICES; USA; DA. 1978; VOL. 25; NO 4; PP. 419-424; BIBL. 8 REF.
Document type
Article
Language
English
Keyword (fr)
LITHOGRAPHIE EXPOSITION CONTROLE VISUEL CONTROLE AUTOMATIQUE LARGEUR FABRICATION MICROELECTRONIQUE ETALONNAGE RESINE PHOTORESIST RESINE POSITIVE LIMITE RESOLUTION ELECTRONIQUE
Keyword (en)
LITHOGRAPHY EXPOSURE VISUAL CONTROL AUTOMATIC MONITORING WIDTH MICROELECTRONIC FABRICATION CALIBRATION RESINS PHOTORESIST RESOLVING POWER ELECTRONICS
Keyword (es)
ELECTRONICA
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics

Discipline
Electronics
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
PASCAL7930175975

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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