ION BEAM TECHNOLOGY APPLIED TO ELECTRON MICROSCOPY
- Author
- FRANKS J
ION TECH LTD., TEDDINGTON MIDDX, GBR - Source
- ADV. ELECTRON. ELECTRON PHYS.; USA; DA. 1978; VOL. 47; PP. 1-50; BIBL. 3 P.
- Document type
- Article
- Language
- English
- Keyword (fr)
- MICROSCOPIE ELECTRONIQUE PREPARATION ECHANTILLON FAISCEAU ION GRAVURE FAISCEAU IONIQUE PULVERISATION FAISCEAU ION APPLICATION APPAREILLAGE METAL SEMICONDUCTEUR COMPOSE MINERAL ELECTRONIQUE
- Keyword (en)
- ELECTRON MICROSCOPY SAMPLE PREPARATION ION BEAM ETCHING APPLICATION METAL SEMICONDUCTOR MATERIALS INORGANIC COMPOUND ELECTRONICS
- Keyword (es)
- ELECTRONICA
- Classification
- Discipline
- Electronics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- PASCAL7930402950
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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