SYSTEMATIC STUDIES OF ALPHA -PARTICLE ELASTIC SCATTERING AND PROTON INDUCED X-RAY EMISSION ON NI-CR THIN FILM RESISTORS
- Author
- JARJIS RA
UNIV. SCHUSTER LAB., MANCHESTER MI3 9PL, GBR - Source
- NUCL. INSTRUM. METHODS; NLD; DA. 1979; VOL. 160; NO 3; PP. 457-460; BIBL. 6 REF.
- Document type
- Article
- Language
- English
- Keyword (fr)
- RESISTANCE COUCHE MINCE ANALYSE CHIMIQUE SURFACE ALLIAGE NICKEL ALLIAGE CHROME EMISSION RX DIFFUSION ELASTIQUE PARTICULE ALPHA RESISTANCE ELECTRIQUE ALLIAGE CHROME NICKEL ELECTRONIQUE
- Keyword (en)
- THIN FILM RESISTOR CHEMICAL ANALYSIS CHEMICAL COMPOSITION SURFACE X RAY EMISSION ELASTIC SCATTERING ALPHA PARTICLE RESISTOR ELECTRONICS
- Keyword (es)
- ELECTRONICA
- Classification
- Discipline
- Electronics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- PASCAL7930451581
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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