ROTATIONAL AND VIBRATIONAL STATE POPULATION DISTRIBUTIONS IN EXCITED CH RADICALS SPUTTERED FROM A CHEMISORPTION LAYER ON SILICON.
- Author
- THOMAS GE; DE KONING BR
PHILIPS RES. LAB., EINDHOVEN, NETH. - Source
- CHEM. PHYS. LETTERS; NLD; DA. 1978; VOL. 55; NO 3; PP. 418-423; BIBL. 24 REF.
- Document type
- Article
- Language
- English
- Keyword (fr)
- COMPOSE ALIPHATIQUE SATURE CETONE COLLISION ION MOLECULE EXCITATION DISSOCIATIVE DISTRIBUTION ENERGIE REACTION MOYENNE ENERGIE RADICAL LIBRE ORGANIQUE HYDROCARBURE ALIPHATIQUE CHIMISORPTION ETAT ROVIBRATIONNEL EXCITE POPULATION NIVEAU ENERGIE HAUTE TEMPERATURE ACETONE METHYLIDYNE COMPOSE ORGANIQUE SUPPORT SI KRYPTON ION ATOMIQUE PHYSIQUE MOLECULAIRE PHYSIQUE ATOMIQUE
- Keyword (en)
- SATURATED ALIPHATIC COMPOUND KETONE ION MOLECULE COLLISION DISSOCIATIVE EXCITATION REACTION ENERGY DISTRIBUTION INTERMEDIATE ENERGY ORGANIC FREE RADICAL CHEMISORPTION ROVIBRATIONALLY EXCITED STATE ENERGY LEVEL POPULATION HIGH TEMPERATURE ACETONE ORGANIC COMPOUNDS MOLECULAR PHYSICS ATOMIC PHYSICS
- Keyword (es)
- FISICA MOLECULAR FISICA ATOMICA
- Classification
- Discipline
- Atomic and molecular physics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- PASCAL7940015583
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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