THERMAL DIFFUSIVITY, SPECIFIC HEAT AND THERMAL CONDUCTIVITY OF CHEMICALLY VAPOR-DEPOSITED SI3N4
- Author
- HIRAI T; HAYASHI S; NIIHARA K
TOHOKU UNIV., SENDAI, JPN - Source
- AMER. CERAM. SOC. BULL.; USA; DA. 1978; VOL. 57; NO 12; PP. 1126-1130; BIBL. 40 REF.
- Document type
- Article
- Language
- English
- Keyword (fr)
- SILICIUM NITRURE REFRACTAIRE DEPOT PHASE VAPEUR PROPRIETE THERMIQUE CONDUCTIVITE THERMIQUE DIFFUSIVITE THERMIQUE CHALEUR MASSIQUE STRUCTURE ETAT AMORPHE STRUCTURE CRISTALLINE FABRICATION METHODE ETUDE LASER INFLUENCE INDUSTRIE CHIMIQUE
- Keyword (en)
- SILICON NITRIDE REFRACTORY MATERIALS VAPOUR DEPOSITION THERMAL PROPERTIES THERMAL CONDUCTIVITY THERMAL DIFFUSIVITY SPECIFIC HEAT AMORPHOUS STATE STRUCTURE CRYSTAL STRUCTURE INVESTIGATION METHOD LASER INFLUENCE CHEMICAL INDUSTRY
- Keyword (es)
- INDUSTRIA QUIMICA
- Classification
- Discipline
- Chemical engineering
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- PASCAL7960221512
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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