PREFERED SPUTTERING ON BINARY ALLOY SURFACES OF THE AL-PD-SI SYSTEM
- Author
- HO PS; LEWIS JE; CHU WK
IBM T.J. WATSON RESEARCH CENTER, YORKTOWN HEIGHTS NY 10598, USA - Source
- SURF. SCI.; NLD; DA. 1979; VOL. 85; NO 1; PP. 19-28; BIBL. 16 REF.
- Document type
- Article
- Language
- English
- Keyword (fr)
- EMISSION ELECTRONIQUE AUGER PULVERISATION CATHODIQUE SURFACE ALLIAGE METAL TRANSITION ALLIAGE ALUMINIUM ALLIAGE SILICIUM ALLIAGE PALLADIUM ALLIAGE BINAIRE COUCHE MINCE ALLIAGE ALUMINIUM PALLADIUM ALLIAGE PALLADIUM SILICIUM ALLIAGE ALUMINIUM SILICIUM PHYSIQUE SOLIDE
- Keyword (en)
- AUGER EMISSION CATHODIC SPUTTERING SURFACE BINARY ALLOY THIN FILM SOLID PHYSICS
- Keyword (es)
- FISICA DEL ESTADO CONDENSADO
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties
- Discipline
- Physics of condensed state : structure, mechanical and thermal properties
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- PASCAL8030038376
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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