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AUTOMATIZATION OF MASK ALIGNMENT: MASK-TO-WAFER POSITION DETECTION THROUGH IMAGE PROCESSING

Author
DOEMENS G
SIEMENS AG,MUNICH,DEU
Source
HANDLING, ASSEMBLY, INSPECTION AND DIMENSIONAL CONTROL IN MANUFACTURING SYSTEMS. CIRP (INTERNATIONAL INSTITUTION FOR PRODUCTION ENGINEERING RESEARCH) INTERNATIONAL SEMINAR ON MANUFACTURING SYSTEMS. 11/1979/NANCY; FRA; DA. S.D.; PP. 97-110; BIBL. 1 REF.
Document type
Conference Paper
Language
English
Keyword (fr)
FABRICATION MICROELECTRONIQUE MASQUE ALIGNEMENT AUTOMATISATION TRAITEMENT IMAGE ELECTRONIQUE
Keyword (en)
MICROELECTRONIC FABRICATION ALIGNMENT AUTOMATION IMAGE PROCESSING ELECTRONICS
Keyword (es)
ELECTRONICA
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics

Discipline
Electronics
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
PASCAL8030141857

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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