AUTOMATIZATION OF MASK ALIGNMENT: MASK-TO-WAFER POSITION DETECTION THROUGH IMAGE PROCESSING
- Author
- DOEMENS G
SIEMENS AG,MUNICH,DEU - Source
- HANDLING, ASSEMBLY, INSPECTION AND DIMENSIONAL CONTROL IN MANUFACTURING SYSTEMS. CIRP (INTERNATIONAL INSTITUTION FOR PRODUCTION ENGINEERING RESEARCH) INTERNATIONAL SEMINAR ON MANUFACTURING SYSTEMS. 11/1979/NANCY; FRA; DA. S.D.; PP. 97-110; BIBL. 1 REF.
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- FABRICATION MICROELECTRONIQUE MASQUE ALIGNEMENT AUTOMATISATION TRAITEMENT IMAGE ELECTRONIQUE
- Keyword (en)
- MICROELECTRONIC FABRICATION ALIGNMENT AUTOMATION IMAGE PROCESSING ELECTRONICS
- Keyword (es)
- ELECTRONICA
- Classification
- Discipline
- Electronics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- PASCAL8030141857
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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