PHOTOCURING OF PHENOL RESIN BY 1-AZIDOPYRENE
- Author
- TSUNODA T; YAMAOKA T; OSABE Y; HATA Y
CHIBA UNIV. FAC. ENG.,CHIBA,JPN - Source
- PHOTOGR. SCI. ENGNG; USA; DA. 1976; VOL. 20; NO 4; PP. 188-194; BIBL. 12 REF.
- Document type
- Article
- Language
- English
- Keyword (fr)
- MATERIAU PHOTOSENSIBLE PHOTORESIST RAYONNEMENT UV IRRADIATION IMPRESSION TYPOGRAPHIQUE REPROGRAPHIE MATERIAU PHOTOGRAPHIQUE PHENOPLASTE RETICULATION PHOTOCHIMIQUE MECANISME REACTION RETICULATION AVICEL METROLOGIE PHYSIQUE THEORIQUE CHIMIE MACROMOLECULAIRE POLYMERES
- Keyword (en)
- PHOTOSENSITIVE MATERIAL PHOTORESIST ULTRAVIOLET RADIATION IRRADIATION TYPOGRAPHIC PRINTING REPROGRAPHY PHOTOGRAPHIC MATERIAL PHENOLICS PHOTOCHEMICAL CROSSLINKING REACTION MECHANISM CROSSLINKING MEASUREMENT SCIENCE THEORETICAL PHYSICS MACROMOLECULAR CHEMISTRY POLYMERS
- Keyword (es)
- METROLOGIA FISICA TEORICA QUIMICA MACROMOLECULAR POLIMEROS
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D09 Physicochemistry of polymers
- Discipline
- Physical chemistry of polymers Theoretical physics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- PASCAL8030146624
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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