ELECTRICAL PROPERTIES AND STRUCTURE OF BORON-DOPED SPUTTER-DEPOSITED POLYCRYSTALLINE FILMS
- Author
- HABERLE K; FROESCHLE E
TECH. UNIV., INST. SEMICONDUCTOR ELECTRON.,AACHEN 5100,DEU - Source
- THIN SOLID FILMS; ISSN 0040-6090; CHE; DA. 1979; VOL. 61; NO 1; PP. 105-113; BIBL. 22 REF.
- Document type
- Article
- Language
- English
- Keyword (fr)
- CONDUCTIVITE ELECTRIQUE CONCENTRATION PORTEUR CHARGE EFFET HALL MOBILITE HALL PREPARATION RECUIT IMPURETE COUCHE MINCE POLYCRISTAL SILICIUM PULVERISATION CATHODIQUE ETAT AMORPHE DOPAGE ANALYSE DIFFRACTION ELECTRON ANALYSE MET ANALYSE ME BALAYAGE PHYSIQUE SOLIDE CRISTALLOGRAPHIE
- Keyword (en)
- ELECTRICAL CONDUCTIVITY CHARGE CARRIER CONCENTRATION HALL EFFECT HALL MOBILITY PREPARATION ANNEALING IMPURITIES THIN FILM POLYCRYSTAL SILICON CATHODIC SPUTTERING AMORPHOUS STATE DOPING SOLID PHYSICS CRISTALLOGRAPHY
- Keyword (es)
- FISICA DEL ESTADO CONDENSADO CRISTALOGRAFIA
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60A Structure of solids and liquids; crystallography
- Discipline
- Physics of condensed state : structure, mechanical and thermal properties
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- PASCAL8030158153
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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