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CONTACT REACTION BETWEEN SI AND PD-W ALLOY FILMS

Author
OLOWOLAFE JO; TU KN; ANGILELLO J
I.B.M.T.J. WATSON RES. CENT.,YORKTOWN HEIGHTS NY 10598,USA
Source
J. APPL. PHYS.; ISSN 0021-8979; USA; DA. 1979; VOL. 50; NO 10; PP. 6316-6320; BIBL. 20 REF.
Document type
Article
Language
English
Keyword (fr)
CONTACT ELECTRIQUE CONTACT METAL SEMICONDUCTEUR SILICIUM ALLIAGE TUNGSTENE ALLIAGE PALLADIUM BARRIERE SCHOTTKY BARRIERE POTENTIEL MESURE RETRODIFFUSION DIFFRACTION RX REACTION CHIMIQUE HAUTEUR BARRIERE ELECTRONIQUE PHYSIQUE SOLIDE
Keyword (en)
ELECTRIC CONTACT SEMICONDUCTOR METAL CONTACT SILICON SCHOTTKY BARRIER POTENTIAL BARRIER MEASUREMENT BACKSCATTERING X-RAY DIFFRACTION ANALYSIS CHEMICAL REACTION BARRIER HEIGHT ELECTRONICS SOLID PHYSICS
Keyword (es)
ELECTRONICA FISICA DEL ESTADO CONDENSADO
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties

Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics

Discipline
Electronics Physics of condensed state : structure, mechanical and thermal properties
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
PASCAL8030185962

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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