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CIF AND F2: TWO NEW ULTRA-VIOLET LASER SYSTEMS

Author
HOHLA K; DIEGELMANN M; PUMMER H; KOMPA KL
MAX-PLANCK-GESELLSCHAFT ZUR FOERDERUNG DER WISSENSCHAFTEN EV,GARCHING 8046,DEU
Source
OPT. LASER TECHNOL.; GBR; DA. 1979; VOL. 11; NO 6; PP. 305-310; BIBL. 16 REF.
Document type
Article
Language
English
Keyword (fr)
LASER UV LASER GAZ FLUOR HALOGENE FLUORURE COMPOSE CHLORE OPTIQUE
Keyword (en)
ULTRAVIOLET LASER GAS LASER FLUORINE HALOGENS FLUORIDES OPTICS
Keyword (es)
OPTICA
Classification
Pascal
001 Exact sciences and technology / 001B Physics

Discipline
Theoretical physics
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
PASCAL8030231713

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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