THICK-FILM FINE PATTERN FORMATION BY A PHOTOLITHOGRAPHIC PROCESS
- Author
- WATANABE Y; ARITOMO A; WATANABE K
FUJITSU LTD.,NAKAHARA-KU KAWASAKI 211,JPN - Source
- I.E.E.E. TRANS. COMPON. HYBR. MANUFG TECHNOL.; USA; DA. 1979; VOL. 2; NO 4; PP. 428-433; BIBL. 5 REF.
- Document type
- Article
- Language
- English
- Keyword (fr)
- CIRCUIT INTEGRE COUCHE EPAISSE FABRICATION MICROELECTRONIQUE PHOTOLITHOGRAPHIE LIMITE RESOLUTION ELECTRONIQUE
- Keyword (en)
- THICK FILM CIRCUIT MICROELECTRONIC FABRICATION PHOTOLITHOGRAPHY RESOLVING POWER ELECTRONICS
- Keyword (es)
- ELECTRONICA
- Classification
- Discipline
- Electronics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- PASCAL8030298899
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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