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AN INTENSE PULSED MAGNETICALLY INSULATED DEUTERON SOURCE

Author
ENDO G; ROBERTSON S
UNIV. CALIFORNIA, PHYS. DEP.,IRVINE CA 92717,USA
Source
APPL. PHYS. LETT.; ISSN 0003-6951; USA; DA. 1979; VOL. 35; NO 11; PP. 849-850; BIBL. 12 REF.
Document type
Article
Language
English
Keyword (fr)
SOURCE ION SOURCE ION PLASMA DEUTERON ISOLATION MAGNETIQUE CARACTERISTIQUE FONCTIONNEMENT ETUDE EXPERIMENTALE FAISCEAU ION FAISCEAU PULSE ELECTRONIQUE
Keyword (en)
ION SOURCE PLASMA ION SOURCE DEUTERON MAGNETIC INSULATION PERFORMANCE CHARACTERISTIC EXPERIMENTAL STUDY PULSED BEAM ELECTRONICS
Keyword (es)
ELECTRONICA
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics

Discipline
Electronics
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
PASCAL8030312574

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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