A TECHNIQUE FOR ELIMINATING STANDING WAVES AND OTHER INTERFERENCE EFFECTS IN PHOTORESIST
- Author
- LANG RJ; SMILOWITZ B
EATON CORP.,DEER PARK NY 11729,USA - Source
- I.E.E.E. TRANS. SONICS ULTRASON.; USA; DA. 1980; VOL. 27; NO 3; PP. 134-136; BIBL. 5 REF.
- Document type
- Article
- Language
- English
- Keyword (fr)
- RESINE PHOTORESIST ONDE STATIONNAIRE INTERFERENCE ELIMINATION PHOTOLITHOGRAPHIE FABRICATION MICROELECTRONIQUE DISPOSITIF ONDE ACOUSTIQUE ONDE SURFACE ELECTRONIQUE
- Keyword (en)
- RESINS PHOTORESIST STANDING WAVE INTERFERENCE ELIMINATION PHOTOLITHOGRAPHY MICROELECTRONIC FABRICATION ACOUSTIC WAVE DEVICE SURFACE WAVES ELECTRONICS
- Keyword (es)
- ELECTRONICA
- Classification
- Discipline
- Electronics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- PASCAL8030433300
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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