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A TECHNIQUE FOR ELIMINATING STANDING WAVES AND OTHER INTERFERENCE EFFECTS IN PHOTORESIST

Author
LANG RJ; SMILOWITZ B
EATON CORP.,DEER PARK NY 11729,USA
Source
I.E.E.E. TRANS. SONICS ULTRASON.; USA; DA. 1980; VOL. 27; NO 3; PP. 134-136; BIBL. 5 REF.
Document type
Article
Language
English
Keyword (fr)
RESINE PHOTORESIST ONDE STATIONNAIRE INTERFERENCE ELIMINATION PHOTOLITHOGRAPHIE FABRICATION MICROELECTRONIQUE DISPOSITIF ONDE ACOUSTIQUE ONDE SURFACE ELECTRONIQUE
Keyword (en)
RESINS PHOTORESIST STANDING WAVE INTERFERENCE ELIMINATION PHOTOLITHOGRAPHY MICROELECTRONIC FABRICATION ACOUSTIC WAVE DEVICE SURFACE WAVES ELECTRONICS
Keyword (es)
ELECTRONICA
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics

Discipline
Electronics
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
PASCAL8030433300

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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