DUAL-WAVELENGTH LASER ANNEALING
- Author
- AUSTON DH; GOLOVCHENKO JA; VENKATESAN TNC
BELL LAB., MURRAY HILL NJ 07974, USA - Source
- APPL. PHYS. LETTERS; USA; DA. 1979; VOL. 34; NO 9; PP. 558-560; BIBL. 9 REF.
- Document type
- Article
- Language
- English
- Keyword (fr)
- SILICIUM IRRADIATION ION DEFAUT IRRADIATION AMORPHISATION RECRISTALLISATION FAISCEAU LASER IMPLANTATION ION ETUDE EXPERIMENTALE METALLOIDE DOPAGE AS CRISTALLOGRAPHIE
- Keyword (en)
- SILICON ION IRRADIATION IRRADIATION DEFECT AMORPHIZATION RECRYSTALLIZATION LASER BEAM ION IMPLANTATION EXPERIMENTAL STUDY CRISTALLOGRAPHY
- Keyword (es)
- CRISTALOGRAFIA
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60A Structure of solids and liquids; crystallography
- Discipline
- Physics of condensed state : structure, mechanical and thermal properties
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- PASCAL8040006402
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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