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A MODEL FOR THE LATERAL VARIATION OF AUTODOPING IN EPITAXIAL FILMS

Author
SRINIVASAN GR
IBM, DATA SYSTEMS DIVISION/HOPEWELL JUNCTION NY 12533/USA
Source
IEEE TRANS. ELECTRON. DEVICES; ISSN 0018-9383; USA; DA. 1980; VOL. 27; NO 8; PP. 1493-1496; BIBL. 5 REF.
Document type
Article
Language
English
Keyword (fr)
DEPOT COUCHE EPITAXIQUE DOPAGE DEPOT CHIMIQUE PHASE VAPEUR COUCHE MINCE SIMULATION NUMERIQUE PREPARATION CIRCUIT INTEGRE FABRICATION METHODE PHASE VAPEUR ELECTRONIQUE
Keyword (en)
EPITAXIAL FILM DOPING CHEMICAL VAPOR DEPOSITION THIN FILM DIGITAL SIMULATION PREPARATION INTEGRATED CIRCUIT GROWTH FROM VAPOR ELECTRONICS
Keyword (es)
ELECTRONICA
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics

Discipline
Electronics
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
PASCAL8130135022

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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