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FORMATION OF A HIGHLY RESISTIVE DEPOSIT IN THE REED CONTACT UNIT

Author
OEGREN S
TELEFON L. M. ERICSON A.B./STOCKHOLM 12625/SWE
Source
I.E.E.E. TRANS. COMPON. HYBR. MANUFG TECHNOL.; USA; DA. 1980; VOL. 3; NO 3; PP. 431-436; BIBL. 7 REF.
Document type
Article
Language
English
Keyword (fr)
CONTACT ELECTRIQUE CONTACT LAME SOUPLE DEPOT RESISTANCE ELEVEE FORMATION DEPOT CARBONE CHARGE ELECTRIQUE ANALYSE CHIMIQUE SPECTROMETRIE AUGER ELECTRONIQUE
Keyword (en)
ELECTRIC CONTACT REED CONTACT HIGH VALUE RESISTOR DEPOSIT FORMATION CARBON ELECTRICAL CHARGE CHEMICAL ANALYSIS CHEMICAL COMPOSITION AUGER ELECTRON SPECTROMETRY AUGER SPECTROSCOPY ELECTRONICS
Keyword (es)
ELECTRONICA
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics

Discipline
Electronics
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
PASCAL8130195904

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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