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A DRY ETCHING TECHNIQUE USING ELECTRON BEAM RESIST-PBS

Author
YAMAZAKI T; WATAKABE Y; SUZUKI Y; NAKATA H
MITSUBISHI ELECTRIC CORP. LSI RESEARCH/ITAMI HYOGO/JPN
Source
J. ELECTROCHEM. SOC.; ISSN 0013-4651; USA; DA. 1980; VOL. 127; NO 8; PP. 1859-1861; BIBL. 2 REF.
Document type
Article
Language
English
Keyword (fr)
FABRICATION MICROELECTRONIQUE GRAVURE PROCEDE VOIE SECHE ELECTRORESIST RESIST GRAVURE PLASMA ELECTRONIQUE
Keyword (en)
MICROELECTRONIC FABRICATION DRY PROCESS ELECTRORESIST RESIST PLASMA ETCHING ELECTRONICS
Keyword (es)
ELECTRONICA
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics

Discipline
Electronics
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
PASCAL8130215719

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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