Pascal and Francis Bibliographic Databases

Help

Permanent link : http://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=PASCAL8130226719

Export

Selection :

APPLICATION OF LASER PROCESSING FOR IMPROVED OXIDES GROWN FROM POLYSILICON

Author
YARON G; HESS LD; KOKOROWSKI SA
HUGHES AIRCRAFT CO./NEWPORT BEACH CA/USA
Source
IEEE TRANS. ELECTRON DEVICES; ISSN 0018-9383; USA; DA. 1980; VOL. 27; NO 5; PP. 964-969; BIBL. 10 REF.
Document type
Article
Language
English
Keyword (fr)
CIRCUIT INTEGRE CIRCUIT MOS LASER SILICIUM POLYCRISTAL FABRICATION MICROELECTRONIQUE OXYDE RECUIT ELECTRONIQUE
Keyword (en)
INTEGRATED CIRCUIT MOS CIRCUIT LASER SILICON POLYCRYSTAL MICROELECTRONIC FABRICATION OXIDES ANNEALING ELECTRONICS
Keyword (es)
ELECTRONICA
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics

Discipline
Electronics
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
PASCAL8130226719

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

Searching the Web