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APPLICATION OF LIME-EDGE PROFILE SIMULATION TO THIN-FILM DEPOSITION PROCESSES

Author
NEUREUTHER AR; CHIU H TING; CHEN YIH LIU
IBM, RESEARCH LABORATORY/SAN JOSE CA 95193/USA
Source
IEEE J. SOLID-STATE CIRCUITS; ISSN 0018-9200; USA; DA. 1980; VOL. 15; NO 4; PP. 514-520; BIBL. 6 REF.
Document type
Article
Language
English
Keyword (fr)
ETUDE THEORIQUE PREPARATION SIMULATION NUMERIQUE DEPOT CIRCUIT INTEGRE MECANISME CROISSANCE PROGRAMME ORDINATEUR COUCHE MINCE CROISSANCE CRISTALLINE ELECTRONIQUE CRISTALLOGRAPHIE
Keyword (en)
THEORETICAL STUDY PREPARATION DIGITAL SIMULATION INTEGRATED CIRCUIT GROWTH MECHANISM COMPUTER PROGRAMS THIN FILM CRYSTAL GROWTH ELECTRONICS CRISTALLOGRAPHY
Keyword (es)
ELECTRONICA CRISTALOGRAFIA
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60A Structure of solids and liquids; crystallography

Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics

Discipline
Electronics Physics of condensed state : structure, mechanical and thermal properties
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
PASCAL8130228703

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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