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LIMITATIONS ON SINGLE BEAM PRODUCTION LITHOGRAPHY

Author
LEVI MW
ROME AIR DEVELOPMENT CENT./GRIFFISS AFB NY 13441/USA
Source
I.E.E.E. ELECTRON DEVICE LETT.; USA; DA. 1980; VOL. 1; NO 10; PP. 194-196; BIBL. 3 REF.
Document type
Article
Language
English
Keyword (fr)
LITHOGRAPHIE FABRICATION MICROELECTRONIQUE CIRCUIT INTEGRE CIRCUIT VLSI LIMITE ELECTRONIQUE
Keyword (en)
LITHOGRAPHY MICROELECTRONIC FABRICATION INTEGRATED CIRCUIT VLSI CIRCUIT LIMIT ELECTRONICS
Keyword (es)
ELECTRONICA
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics

Discipline
Electronics
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
PASCAL8130251566

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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