THE EFFECT OF TRAPPED ARGON ON THE MINIMUM TEMPERATURE FOR IMPULSE STIMULATED "EXPLOSIVE" CRYSTALLIZATION OF DC SPUTTER-DEPOSITED AMORPHOUS GERMANIUM FILMS
- Author
- WICKERSHAM CE
BATTELLE'S COLUMBUS LAB./COLUMBUS OH 43201/USA - Source
- SOLID STATE COMMUN.; ISSN 0038-1098; USA; DA. 1980; VOL. 34; NO 12; PP. 907-910; BIBL. 11 REF.
- Document type
- Article
- Language
- English
- Keyword (fr)
- NON METAL ELEMENT GROUPE IVB ETAT AMORPHE PULVERISATION CATHODIQUE PIEGEAGE IMPURETE CONCENTRATION IMPURETE TEMPERATURE ETUDE EXPERIMENTALE COUCHE MINCE CRISTALLISATION IMPURETE GERMANIUM IMPURETE ARGON CRISTALLOGRAPHIE
- Keyword (en)
- NON METAL GROUP IVB ELEMENT AMORPHOUS STATE CATHODIC SPUTTERING IMPURITY TRAPPING IMPURITY DENSITY TEMPERATURE EXPERIMENTAL STUDY THIN FILM CRYSTALLIZATION IMPURITIES GERMANIUM CRISTALLOGRAPHY
- Keyword (es)
- CRISTALOGRAFIA
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60A Structure of solids and liquids; crystallography
- Discipline
- Physics of condensed state : structure, mechanical and thermal properties
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- PASCAL8130294800
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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