THE DOPED SI/SIO2 INTERFACE
- Author
- SNEL J
PHILIPS RESEARCH LABORATORIES/EINDHOVEN/NLD - Source
- SOLID-STATE ELECTRON.; ISSN 0038-1101; GBR; DA. 1981; VOL. 24; NO 2; PP. 135-139; BIBL. 11 REF.
- Document type
- Article
- Language
- English
- Keyword (fr)
- CONTACT ELECTRIQUE CONTACT OXYDE SEMICONDUCTEUR ETAT ELECTRONIQUE INTERFACE SILICIUM DOPAGE OXYDATION THERMIQUE IMPURETE PHOSPHORE IMPURETE ARSENIC IMPURETE BORE IMPURETE GALLIUM ELECTRONIQUE
- Keyword (en)
- ELECTRIC CONTACT SEMICONDUCTOR OXIDE CONTACT INTERFACE ELECTRON STATE SILICON DOPING ELECTRONICS
- Keyword (es)
- ELECTRONICA
- Classification
- Discipline
- Electronics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- PASCAL8130367742
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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