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APPLICATION OF DIFFERENTIAL INTERFERENCE CONTRAST AND INTERFEROMETRY TO THE STUDY OF PHOTORESIST COATINGS

Author
MANTLE H
LAB. SUISSE RECH. HORLOGERES/NEUCHATEL 2000/CHE
Source
BULL. ANNU. SOC. SUISSE CHRONOM. LAB. SUISSE RECH. HORLOG.; ISSN 0366-3124; CHE; DA. 1981; VOL. 10; PP. 147-156; BIBL. 10 REF.
Document type
Conference Paper
Language
English
Keyword (fr)
PHOTORESIST EPAISSEUR COUCHE MINCE MICROSCOPIE OPTIQUE INTERFEROMETRIE OPTIQUE CIRCUIT INTEGRE PHOTOLITHOGRAPHIE DIMENSION MESURE METROLOGIE PHYSIQUE THEORIQUE
Keyword (en)
THICKNESS THIN FILM OPTICAL MICROSCOPY OPTICAL INTERFEROMETRY INTEGRATED CIRCUIT DIMENSIONS MEASUREMENT MEASUREMENT SCIENCE THEORETICAL PHYSICS
Keyword (es)
METROLOGIA FISICA TEORICA
Classification
Pascal
001 Exact sciences and technology / 001B Physics

Discipline
Theoretical physics
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
PASCAL82X0031324

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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