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OCTAHEDRAL PRECIPITATES IN HIGH TEMPERATURE ANNEALED CZOCHRALSKI-GROWN SILICON

Author
SHIMURA F
NIPPON ELECTRIC CO. LTD./KAWASAKI/JPN
Source
J. CRYST. GROWTH; ISSN 0022-0248; NLD; DA. 1981; VOL. 54; NO 3; PP. 588-591; BIBL. 13 REF.
Document type
Article
Language
English
Keyword (fr)
NON METAL MONOCRISTAL METHODE CZOCHRALSKI RECUIT ETUDE EXPERIMENTALE MICROSCOPIE ELECTRONIQUE TRANSMISSION HAUTE TEMPERATURE SPECTROMETRIE IR CROISSANCE CRISTALLINE SILICIUM CRISTALLOGRAPHIE
Keyword (en)
NON METAL SINGLE CRYSTAL CZOCHRALSKI METHOD ANNEALING EXPERIMENTAL STUDY TRANSMISSION ELECTRON MICROSCOPY HIGH TEMPERATURE INFRARED SPECTROMETRY CRYSTAL GROWTH SILICON CRISTALLOGRAPHY
Keyword (es)
CRISTALOGRAFIA
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60A Structure of solids and liquids; crystallography

Discipline
Physics of condensed state : structure, mechanical and thermal properties
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
PASCAL82X0033149

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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