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A NEW LOW TEMPERATURE III-V MULTILAYER GROWTH TECHNIQUE: VACUUM METALORGANIC CHEMICAL VAPOR DEPOSITION

Author
FRAAS LM
CHEVRON RESEARCH CO./RICHMOND CA 94802/USA
Source
J. APPL. PHYS.; ISSN 0021-8979; USA; DA. 1981; VOL. 52; NO 11; PP. 6939-6943; BIBL. 11 REF.
Document type
Article
Language
English
Keyword (fr)
COMPOSE MINERAL COMPOSE III-V DEPOT CHIMIQUE PHASE VAPEUR COMPOSE ORGANOMETALLIQUE VIDE COUCHE MULTIPLE BASSE TEMPERATURE ETUDE EXPERIMENTALE MICROSCOPIE ELECTRONIQUE BALAYAGE CELLULE SOLAIRE DISPOSITIF PHOTOELECTRIQUE ENERGIE SOLAIRE ETATS UNIS COUCHE MINCE COUCHE EPITAXIQUE CROISSANCE CRISTALLINE GALLIUM ARSENIURE GALLIUM PHOSPHOARSENIURE GALLIUM INDIUM ARSENIURE MIXTE SOLUTION SOLIDE EQUIPEMENT PROCEDE FABRICATION SUPPORT GAAS SUPPORT GE CRISTALLOGRAPHIE ELECTRONIQUE ENERGIE
Keyword (en)
INORGANIC COMPOUND III-V COMPOUND CHEMICAL VAPOR DEPOSITION ORGANOMETALLIC COMPOUND VACUUM MULTILAYER LOW TEMPERATURE EXPERIMENTAL STUDY SCANNING ELECTRON MICROSCOPY SOLAR CELL PHOTOELECTRIC CELL SOLAR ENERGY UNITED STATES THIN FILM EPITAXIAL FILM CRYSTAL GROWTH GALLIUM ARSENIDES GALLIUM ARSENIDES PHOSPHIDES GALLIUM INDIUM ARSENIDES MIXED CRISTALLOGRAPHY ELECTRONICS ENERGY
Keyword (es)
CRISTALOGRAFIA ELECTRONICA ENERGIA
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60A Structure of solids and liquids; crystallography

Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics

Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D06 Energy

Discipline
Electronics Energy Physics of condensed state : structure, mechanical and thermal properties
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
PASCAL82X0147893

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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