IMPURITY PROFILE OF IMPLANTED IONS IN SILICON
- Author
- MAES H; VAN DERVORST W; VAN OVERST RAETEN R
KATOLICKE UNIV. LEUVEN, ESAT LAB./HEVERLEE 3030/BEL - Source
- MATER. PROCESS.-THEORY PRACT.; NLD; DA. 1981; VOL. 2; PP. 443-638; BIBL. 254 REF.
- Document type
- Article
- Language
- English
- Keyword (fr)
- NON METAL DISTRIBUTION IMPURETE ETUDE EXPERIMENTALE ETUDE THEORIQUE ETUDE COMPARATIVE IMPLANTATION ION SILICIUM CRISTALLOGRAPHIE
- Keyword (en)
- NON METAL IMPURITY DISTRIBUTION EXPERIMENTAL STUDY THEORETICAL STUDY COMPARATIVE STUDY ION IMPLANTATION SILICON CRISTALLOGRAPHY
- Keyword (es)
- CRISTALOGRAFIA
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60A Structure of solids and liquids; crystallography
- Discipline
- Physics of condensed state : structure, mechanical and thermal properties
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- PASCAL82X0184168
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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