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DUAL-POLARITY, SINGLE-RESIST MIXED (E-BEAM/PHOTO) LITHOGRAPHY

Author
BERKER TD; BERNACKI SE
SPERRY RES. CENT./SUDBURY MA 01776/USA
Source
ELECTRON DEVICE LETT.; ISSN 0193-8576; USA; DA. 1981; VOL. 2; NO 11; PP. 281-283; BIBL. 3 REF.
Document type
Article
Language
English
Keyword (fr)
FABRICATION MICROELECTRONIQUE LITHOGRAPHIE FAISCEAU ELECTRON PHOTOLITHOGRAPHIE RESIST IMAGE DEVELOPPEMENT ELECTRONIQUE
Keyword (en)
MICROELECTRONIC FABRICATION ELECTRON BEAM LITHOGRAPHY PHOTOLITHOGRAPHY RESIST IMAGE DEVELOPMENT ELECTRONICS
Keyword (es)
ELECTRONICA
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics

Discipline
Electronics
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
PASCAL82X0277297

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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