ROOM TEMPERATURE ELECTROLESS NICKEL PLATING OF N-TYPE SILICON, ITS POSSIBLE APPLICATION IN SOLAR CELLS
- Author
- SAHA NR; BISWAS D; DHAR S
INST. RADIO PHYS. ELECTRON/CALCUTTA 700009/IND - Source
- INDIAN J. PHYS., A; ISSN 501352; IND; DA. 1980 PUBL. 1981; VOL. 54; NO 3; PP. 258-263; H.T. 1; BIBL. 8 REF.
- Document type
- Article
- Language
- English
- Keyword (fr)
- ENERGIE SOLAIRE EQUIPEMENT CELLULE SOLAIRE METALLISATION TECHNOLOGIE ETUDE EXPERIMENTALE INDE DISPOSITIF PHOTOELECTRIQUE TEMPERATURE AMBIANTE DEPOT ELECTROLYTIQUE NICKEL SILICIUM ENERGIE ELECTRONIQUE
- Keyword (en)
- SOLAR ENERGY EQUIPMENT SOLAR CELL METALLIZATION TECHNOLOGY EXPERIMENTAL STUDY INDIA PHOTOELECTRIC CELL ROOM TEMPERATURE ELECTROPLATING NICKEL SILICON ENERGY ELECTRONICS
- Keyword (es)
- ENERGIA ELECTRONICA
- Classification
- Discipline
- Electronics Energy
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- PASCAL82X0278886
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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