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ACTIVATION ENERGY OF ELECTROMIGRATION IN THIN METAL FILMS

Author
YUNZHONG W; CHENGLONG S
ACADEMIA SINICA. INST. OF METALLURGY/SHANGHAI/CHN
Source
ACTA METALL. SIN.; CHN; DA. 1981-12; VOL. 17; NO 6; PP. 635-642; BIBL. 13 REF.
Document type
Article
Language
Chinese
Keyword (fr)
ELECTRODIFFUSION DEFAUT PONCTUEL!SEC CONDUCTIVITE ELECTRIQUE MODELE MATHEMATIQUE COUCHE MINCE!SUB ENERGIE ACTIVATION ALLIAGE2 AL:>50 CU:3-5!SUB METAL PUR AL!SUB METALLURGIE
Keyword (en)
ELECTRODIFFUSION POINT DEFECT!SEC ELECTRICAL CONDUCTIVITY MATHEMATICAL MODEL THIN FILM!SUB ACTIVATION ENERGY METALLURGY
Keyword (es)
METALURGIA
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D11 Metals. Metallurgy

Discipline
Metals. Metallurgy
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
PASCAL8300227055

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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