ELECTRICAL AND STRUCTURAL PROPERTIES OF ION-IMPLANTED AND POST-ANNEALED SILICIDE FILMS
- Author
- SORIMACHI Y; ISHIWARA H; YAMAMOTO H; FURUKAWA S
TOKYO INST. TECHNOL./YOKOHAMA 227/JPN - Source
- JAPANESE JOURNAL OF APPLIED PHYSICS; ISSN 0021-4922; JPN; DA. 1982; VOL. 21; NO 5; PART. 1; PP. 752-756; BIBL. 7 REF.
- Document type
- Article
- Language
- English
- Keyword (fr)
- COMPOSE MINERAL METAL TRANSITION COMPOSE ALLIAGE BINAIRE METAL TRANSITION ALLIAGE RECUIT TRAITEMENT THERMIQUE DIFFUSION ION RETRODIFFUSION RUTHERFORD CANALISATION PARTICULE PERFECTION CRISTALLINE CONDUCTIVITE ELECTRIQUE COUCHE EPITAXIQUE IMPLANTATION ION COBALT SILICIURE NICKEL SILICIURE PALLADIUM SILICIUM ALLIAGE ETUDE EXPERIMENTALE DEFAUT IRRADIATION IRRADIATION ION ARGON ION ATOMIQUE RETRODIFFUSION HELIUM ION ATOMIQUE SUPPORT SI CRISTALLOGRAPHIE PHYSIQUE SOLIDE
- Keyword (en)
- INORGANIC COMPOUND TRANSITION METAL COMPOUNDS BINARY ALLOY TRANSITION METAL ALLOYS ANNEALING HEAT TREATMENT ION SCATTERING RUTHERFORD BACKSCATTERING CHANNELING CRYSTAL PERFECTION ELECTRICAL CONDUCTIVITY EPITAXIAL FILM ION IMPLANTATION COBALT SILICIDES NICKEL SILICIDES PALLADIUM SILICON ALLOYS CRISTALLOGRAPHY SOLID PHYSICS
- Keyword (es)
- CRISTALOGRAFIA FISICA DEL ESTADO CONDENSADO
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60A Structure of solids and liquids; crystallography
- Discipline
- Physics of condensed state : structure, mechanical and thermal properties
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- PASCAL83X0196796
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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